Business Editors/High-Tech Writers
SEMICON Japan 2005

CHIBA, Japan--(BUSINESS WIRE)--Dec. 7, 2005--Cymer, Inc.
(Nasdaq:CYMI), the world's leading supplier of deep ultraviolet (DUV)
light sources used in semiconductor manufacturing, today launched its
XLA 400 at Cymer's 13th Annual Lithography Symposium in Chiba, Japan.
This fifth generation MOPA-based light source offers chipmakers the
highest repetition rate at 6 kilohertz (kHz) and 90 watts (W) of
output power -- making it the industry's highest-powered light source
available, to drive the volume production of semiconductor devices at
the 65nm node and enable design flexibility for hyper NA (greater than
1.0) immersion lithography tools at the 45nm node and beyond.
Since this product line was introduced in 2002, Cymer has
installed more than 190 XL series light sources at chipmakers
worldwide -- a true testament to the platform's proven criticality in
enabling the extension of optical lithography for the semiconductor
industry. The XLA 400 leverages Cymer's rich history of technology
innovation and expertise, and extensive optical materials knowledge,
as well as the company's production-proven MOPA platform, to offer the
industry's most dependable solution for semiconductor processing at
the 65nm and 45nm nodes. Further, the XLA 400 offers increased power
to support various illumination schemes, permitting tighter dose
stability and more stringent critical dimension (CD) control.
"The extension of optical lithography is vital for both the
technological and economical advancement of the semiconductor market,"
said Klaus Rinnen, managing vice president and semiconductor equipment
industry analyst at Gartner. "Lithography will remain a critical
enabler of Moore's Law and the creation of smaller, more powerful
semiconductors."
"After five successive product generations we've developed thus
far in our XL Series -- since its introduction only three years ago --
we are excited, as a critical enabler of optical lithography, to play
such a key role in the overall semiconductor industry," said Cymer
Chairman and CEO, Bob Akins. "The unveiling of the XLA 400 is yet another
demonstration of Cymer's continued commitment to provide customers
with tools vital for advanced semiconductor manufacturing processes."
By delivering the highest power output available, the XLA 400 will
allow chipmakers to push ArF lithography down to the 45nm node,
without having to suffer throughput loss and reduced productivity
associated with advanced reticle enhancement techniques (RETs) that
will be required to support this node, thus helping them realize the
highest possible return on their lithography investment. Innovating
rapidly to meet dynamic market demand, Cymer debuts the XLA 400 only
six months after announcing the XLA 300. Deliveries of the XLA 400
will begin in the second quarter of 2006.
Kicking off the first day of SEMICON Japan 2005, Cymer held its
13th Annual Japan Lithography Symposium, featuring speakers from a
number of industry leading companies discussing the extension of
optical lithography through the 32nm node. For more event information
please visit http://www.cymer.com/news/event_detail.cfm?key=34.
Editors interested in learning more about the XLA 400 first-hand or
meeting with company executives to learn more about the company's
entire product portfolio are encouraged to contact Meggan Powers at
MPowers@cymer.com.

Forward Looking Statements

Statements in this press release that are not strictly historical
in nature are forward-looking statements. These statements include,
but are not limited to, references to the XLA 400 enabling volume
production at the 65nm node and design flexibility for hyper NA tools
at the 45nm node and beyond; the XLA 400 being the industry's most
dependable solution for semiconductor manufacturing at the 65nm node
and supporting various illumination schemes, and allowing chipmakers
to push ArF lithography to the 45nm node; the various benefits to
chipmakers of using this tool; and the expected delivery schedule for
the XLA 400s. Each of these statements is based only on current
information and expectations that are inherently subject to change and
involve a number of risks and uncertainties. Actual events or results
may differ materially from those projected in such statements due to
various factors, including but not limited to: the possibility that
the XLA 400 light source will not perform up to expectations or that a
competitor's light source may prove to be superior; the demand for
semiconductors in general, and, in particular, for leading-edge
devices with smaller geometries; the rate at which semiconductor
manufacturers take delivery of photolithography tools from the
company's customers; delays or cancellations by customers of their
orders; new and enhanced product offerings by competitors; the timing
of customer orders, shipments and acceptances; inability by the
company to meet its production and/or product development schedules;
inability of the company to secure adequate supplies of critical
components for its advanced products; and failure by the company to
manage its expense levels and unanticipated expenses. For a discussion
of these and other factors which may cause our actual events or
results to differ from those projected, please refer to the company's
most recent annual report on Form 10-K and quarterly reports on Form
10-Q, as well as other subsequent filings with the Securities and
Exchange Commission.

About Cymer

Cymer, Inc. is the world's leading supplier of DUV illumination
sources, the essential light source for DUV photolithography systems.
DUV lithography is a key enabling technology that has allowed the
semiconductor industry to meet the exacting specifications and
manufacturing requirements for volume production of today's advanced
semiconductor chips. Further information on Cymer may be obtained from
the Company's SEC filings, on the Internet at www.cymer.com or by
contacting the company directly.