Cymer and KLA-Tencor Collaborate to Speed
Lithography Process Optimization

Cymer's Light Source Spectra to Be Incorporated
into KLA-Tencor's PROLITH(TM) Advanced
Lithography Process Optimization Tool.

SAN JOSE, Calif.--Feb. 21, 2006--Cymer, Inc. (Nasdaq:CYMI), the
world's leading supplier of deep ultraviolet (DUV) excimer laser light
sources used in semiconductor manufacturing, today announced an
agreement to collaborate with KLA-Tencor (NASDAQ:KLAC), the leading
supplier of process control and yield management solutions for the
semiconductor industry. As part of the agreement, Cymer will provide
details of light source spectra to be incorporated into KLA-Tencor's
industry-standard PROLITH lithography optimization tool. In addition,
the companies expect to continue to jointly develop enhancements to
this capability for future PROLITH revisions.
Through this collaboration, Cymer and KLA-Tencor plan to leverage
their proven technology expertise to deliver increased accuracy,
giving users immediate access to a more accurate representation of the
complete optical lithography process. As a result, customers can
optimize their lithography processes much faster, thus reducing their
time-to-production and maximizing overall return on investment (ROI),
critical differentiators for success in today's advanced lithography
arena.
"The effect of laser bandwidth on critical dimensions (CD) becomes
more significant with higher numerical apertures (NA) and shrinking
process windows. As these effects become progressively greater, we see
a growing need to provide a more accurate representation of the light
source spectrum available to our customers," said Edward Charrier,
General Manager, Process Analysis Division, KLA-Tencor. "By leveraging
Cymer's laser spectral data and expertise, we can offer customers a
truly comprehensive representation of the complete optical lithography
process, and provide an added level of accuracy."
The PROLITH advanced lithography process optimization tool
provides users with insight into the effects of lithography process
variables while evaluating process performance improvements. With the
new enhancements, customers using PROLITH will be able to model the
effects of changes in light source spectral characteristics on their
advanced lithography processes, and use these results to better
optimize their process to minimize the effects of the variations.
"We have been collaborating with KLA-Tencor on simulating the
impact of laser bandwidth on CD for over five years and are pleased to
join forces, once again, to meet a critical industry need with the
development of the latest version of PROLITH," said Nigel Farrar,
Cymer's vice president Lithography Applications Marketing.
"KLA-Tencor's integration of our bandwidth data into PROLITH builds on
Cymer's extensive research into the effect of laser bandwidth on
imaging and provides customers with enabling technology for
next-generation lithography."
The latest update of PROLITH, version 9.3.1, is available to users
now.

Forward Looking Statements

Statements in this press release that are not strictly historical
in nature are forward-looking statements. These statements include,
but are not limited to, references to Cymer providing light source
spectra for KLA-Tencor's PROLITH tool and expectations for the tool's
performance; the companies' joint development of the tool's future
enhancements; the benefits that KLA-Tencor's customers may be expected
to realize from using this tool; the apparent need to make this tool
available to KLA-Tencor's customers due to the requirement for
increasing accuracy in semiconductor photolithography processes and
the growing need to be able to measure the effectiveness and accuracy
of lithography processes currently utilized in production; and the
potential benefits that Cymer's expertise may make available to
KLA-Tencor and its customers. Each of these statements is based only
on current information and expectations that are inherently subject to
change and involve a number of risks and uncertainties. Actual events
or results may differ materially from those projected in such
statements due to various factors, including but not limited to: the
possibility that the PROLITH tool will not perform up to expectations
or that a competitor's tool may prove to be superior; the demand for
semiconductors in general, and, in particular, for leading-edge
devices with smaller geometries that require more rigorous lithography
capabilities; delays or cancellations by customers of their orders;
new and enhanced product offerings by competitors; the timing of
customer orders, shipments and acceptances; inability by the company
to meet its production and/or product development schedules; inability
of the company to secure adequate supplies of critical components for
its products; and the inability of the partners in this partnership to
continue to improve the PROLITH tool as anticipated. For a discussion
of these and other factors which may cause actual events or results to
differ from those projected, please refer to KLA-Tencor's or Cymer's
most recent annual report on Form 10-K and quarterly reports on Form
10-Q, as well as other subsequent filings with the Securities and
Exchange Commission.

About Cymer

Cymer, Inc. is the world's leading supplier of DUV illumination
sources, the essential light source for DUV photolithography systems.
DUV lithography is a key enabling technology that has allowed the
semiconductor industry to meet the exacting specifications and
manufacturing requirements for volume production of today's advanced
semiconductor chips. Further information on Cymer may be obtained from
the Company's SEC filings, on the Internet at www.cymer.com or by
contacting the company directly.

About KLA-Tencor

KLA-Tencor is the world leader in yield management and process
control solutions for semiconductor manufacturing and related
industries. Headquartered in San Jose, Calif., the company has sales
and service offices around the world. An S&P 500 company, KLA-Tencor
is traded on the Nasdaq National Market under the symbol KLAC.
Additional information about the company is available on the Internet
at http://www.kla-tencor.com